Polymers which can be cross-linked by photopolymerization

US4001016A · kind A · utility

Assignee

• AGFA-Gervaert AG · DE

Inventors

• Hans J. Rosenkranz · Krefeld, DE
• Hans Rudolph · Krefeld, DE
• Erich Wolff · Solingen, DE
• Harald von Rintelen · Leverkusen, DE

Key dates

• Filing date: Dec 9, 1974
• Grant date: Jan 4, 1977
• Expiry date: Dec 9, 1994

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0388
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Relief or resist images can be produced by means of a photosensitive material including a photosensitive layer with a polymer as defined hereinafter containing vinyl groups capable of being cross-linked upon exposure to actinic light to yield unsoluble cross-linked products at the exposed areas while the polymer in the unexposed areas remain soluble.