Local surface analysis
US4001582A · kind A · utility
2Cited by
4References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 20, 1975 |
| Grant date | Jan 4, 1977 |
| Priority date | — |
| Expiry date | Jun 20, 1995 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/16
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In an apparatus for local surface analysis of a target sample in which an ion probe is directed to the target for sputtering particles. A chamber having walls heated to a high temperature (above 2200.degree. K as a rule) collects sputtered particles. The particles entering the chamber are subjected to successive adsorptions and desorptions before they leave the chamber for entry into a mass spectrometer. Scanning may be provided as in conventional SIMS systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.