Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports
US4006340A · kind A · utility
114Cited by
3References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 20, 1974 |
| Grant date | Feb 1, 1977 |
| Priority date | — |
| Expiry date | Sep 20, 1994 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32055
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus consisting in forming, with the oxide to be sprayed on, a plasma in an arc state within a source cavity. The state is stabilized by various known methods but which are well-adapted and the substrate to be covered is preferably kept at a predetermined distance, in order of 50 cm, from the source cavity. A positive pressure gas is supplied to the source cavity and vacuum pressure is maintained in the enclosure supporting the substrate facing the cavity opening to deposit oxide uniformly at high speed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.