High speed positive photoresist composition
US4009033A · kind A · utility
19Cited by
6References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1975 |
| Grant date | Feb 22, 1977 |
| Priority date | — |
| Expiry date | Sep 22, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photoresist having increased sensitivity to light and formed by the addition of an acidic compound to a 1,2-quinone-diazide sulphonic acid ester sensitizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.