Migration imaging system
US4013462A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1969 |
| Grant date | Mar 22, 1977 |
| Priority date | — |
| Expiry date | Jun 30, 1989 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G17/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Migration material dispersed throughout a softenable layer is caused to imagewise selectively migrate to at least locations in depth in the softenable layer, by (A) subjecting said migration material to an imagewise migration force and changing the resistance of said softenable layer, to migration of migration material or by (B) subjecting said migration material to a migration force and imagewise changing the resistance of said softenable layer to migration of migration material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.