Method for coating a substrate
US4013532A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 1975 |
| Grant date | Mar 22, 1977 |
| Priority date | — |
| Expiry date | Mar 3, 1995 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for coating a substrate with a layer of polymerized material by simultaneous glow discharge polymerization and sputtering is disclosed. A substrate and two electrodes are placed in a chamber which can be evacuated. An appropriate pressure of a gas which can form a polymer is introduced into the chamber. A glow discharge is established in the gas. Molecules of starting gas and reactive species created in the glow discharge deposit on the electrodes and on the substrate. Material deposited on at least one of the electrodes is sputtered onto the substrate by applying an electric potential, preferably an AC potential, across the electrodes. The glow discharge is preferably confined to a region adjacent to the sputtered electrode. This confinement may be accomplished by the use of a planar magnetron sputtering cathode. The method and apparatus disclosed allow the rapid deposition of high quality polymeric coatings at low gas pressures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.