Method for providing porous broad-band antireflective surface layers on chemically-durable borosilicate glasses
US4019884A · kind A · utility
23Cited by
7References
6Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 22, 1976 |
| Grant date | Apr 26, 1977 |
| Priority date | — |
| Expiry date | Jan 22, 1996 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C15/00
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for providing broad-band antireflective surface layers on a chemically durable borosilicate glass which comprises phase-separating the glass by heat treatment at 630.degree.-660.degree. C., removing a siliceous surface layer from the glass, and treating the glass in an aqueous solution containing both H.sup.+ ions and F.sup.- ions for a time sufficient to produce the antireflective surface layer, is described. Antireflective surface layers exhibiting reflectances as low as 0.5% throughout the wavelength range from about 0.4-2.0 microns have been produced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.