Scanning photographic printer for integrated circuits
US4023126A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 26, 1975 |
| Grant date | May 10, 1977 |
| Priority date | — |
| Expiry date | Jun 26, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70366
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
One embodiment of the disclosed apparatus converges a beam of light to a point of focus and scans that point of focus through an arc at a predetermined radius. The beam of light is then imaged to another point of focus by a unitary power optical system. The second point of focus, therefore, also scans through an identical arc which is displaced by a selected distance along the optical axis from the first point of focus. A master mask for exposing a photoresist on a semiconductor wafer is located at the first point of focus and the semiconductor wafer whose layer of photoresist is to be exposed is located at the second point of focus. However, the mask and wafer are mounted in a different fixture which is radially translatable relative to the scanning beam of light so that a sequence of scans of the beam of light across the mask and wafer serves to illuminate all areas of the mask and to thereby image the information on the mask onto the photoresist layer on the semiconductor wafer. In this manner, the information contained in the mask is rapidly and economically transferred from the mask to the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.