Alkali-resistant radiation curable ene-thiol compositions
US4031271A · kind A · utility
23Cited by
3References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 17, 1975 |
| Grant date | Jun 21, 1977 |
| Priority date | — |
| Expiry date | Nov 17, 1995 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0076
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention is directed to alkali-resistant, radiation curable compositions comprising PA1 A. a polyene And PA1 B. a polythiol of the formula ##STR1## WHERE R is an aliphatic hydrocarbon moiety containing 2-6 carbon atoms, R.sub.2 is an alkylene group containing 2-6 carbon atoms, R.sub.1 is hydrogen or --OH, n is 2-6, and m is 1-2. A photosensitizer is added to the composition when curing is by U. V. radiation. The cured composition is operable as an additive plating resist in the manufacture of electronic circuitry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.