Process for gas polishing sapphire and the like
US4038117A · kind A · utility
6Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 1975 |
| Grant date | Jul 26, 1977 |
| Priority date | — |
| Expiry date | Sep 4, 1995 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B33/00
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for polishing surfaces of sapphire or similar materials to remove surface imperfections visible at magnifications of 1,000X or higher regardless of the shape of the surface, is disclosed, which process comprises the steps of heating the material to an elevated temperature and exposing the surface to be polished to a static hydrogen environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.