Method of producing high-purity transparent vitreous silica
US4038370A · kind A · utility
31Cited by
1References
6Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 23, 1975 |
| Grant date | Jul 26, 1977 |
| Priority date | — |
| Expiry date | Sep 23, 1995 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/40
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of producing high-purity transparent vitreous silica by supplying to a burner a high-purity silane type gas, and an inert gas, hydrogen gas and oxygen gas to effect the flame hydrolysis, comprising growing highly pure transparent vitreous silica at a controlled atmosphere of said flame that may increase the oxygen defect concentration of the vitreous silica, and thereafter heat-treating said formed body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.