Resins for use as electron resists
US4041191A · kind A · utility
3Cited by
5References
4Claims
0Family size
Inventors
Key dates
| Filing date | Nov 6, 1975 |
| Grant date | Aug 9, 1977 |
| Priority date | — |
| Expiry date | Nov 6, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
An electron sensitive resin comprising a random polymer of ethylene glycol methacrylate with triethylene glycol dimethacrylate, randomly crosslinked, and having a degree of polymerization of from 10 to 1000, is described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.