Reticle calibrated diameter gauge
US4043673A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 9, 1975 |
| Grant date | Aug 23, 1977 |
| Priority date | — |
| Expiry date | Apr 9, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A non-contact optical gauging device in which a laser beam is deflected to produce a bidirectional scan. The beam is split; a measuring portion scans an object being inspected while the other portion scans a calibration reticle having alternating opaque and transparent bands. The alternating transmission and ocultation of the beam through the reticle is used to generate calibration pulses, each representing a predetermined increment of movement of the calibration beam. Ocultation of the measuring beam by the object being measured generates a signal which is used to control counting of the calibration pulses as an indication of the dimension being measured. Bidirectional averaging is employed to minimize errors due to object motion in the direction of beam scanning. Variations are disclosed in which two measuring beams and one or two calibration beams, are employed for measuring large objects or for dual axis measurement, the latter by orthogonal projection onto the object being measured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.