Device for providing high-intensity ion or electron beam

US4046666A · kind A · utility

Assignee

• The United States of America as represented by the United States Energy Research and Development Administration · US

Inventors

• Edwin D. McClanahan · Richland, US
• Ronald W. Moss · Richland, US

Key dates

• Filing date: May 7, 1976
• Grant date: Sep 6, 1977
• Expiry date: May 7, 1996

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/34
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.