Exposure control system having dynamic aperture flash arrangement
US4047191A · kind A · utility
26Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 22, 1975 |
| Grant date | Sep 6, 1977 |
| Priority date | — |
| Expiry date | Dec 22, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B7/16
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresponsive, shutter-diaphragm exposure control system having light regulating blades displaced from a light-blocking position to define increasing aperture values during an exposure interval includes a source of flash illumination which is energized with or just prior to initiation of the exposure interval for flash operation. In this arrangement, the flash illumination envelope is superimposed in a leading arrangement on the aperture opening curve so as to provide increasing illumination intensity in slightly leading relation to the increasing aperture values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.