Exposure area control for an optical scanning system for manufacturing cathode ray tubes
US4050081A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 23, 1976 |
| Grant date | Sep 20, 1977 |
| Priority date | — |
| Expiry date | Jun 23, 1996 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/2272
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In an optical scanning exposure system for manufacturing cathode ray tubes having a faceplate with an inner surface layer of photosensitive material and an adjacent apertured mask wherein the exposure system includes a light source providing a light beam, an angle of incidence deflector means for deflecting the light beam at an angle related to the angle of incidence of an electron beam, means for imaging the light beam, and a means for scanning the light beam in a predetermined fashion over the apertured mask to expose the photosensitive material, a control system having a means for storing information representative of the angle of incidence of a light beam and the rate of scanning of a light beam between a matrix of positional locations on the faceplate, a scan rate means for controlling the rate of horizontal and vertical light beam scanning, an encoder means providing light beam positional information to the storage means, and an angle of incidence control means for activating the angle of incidence deflector means in accordance with angular information of the storage means. Other aspects of the invention include controlling the integral with respect to time of the light beam …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.