Electrodeposition of copper
US4053377A · kind A · utility
9Cited by
6References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 13, 1976 |
| Grant date | Oct 11, 1977 |
| Priority date | — |
| Expiry date | Feb 13, 1996 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25C7/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention consists of a method for electrowinning or electrorefining of metals, particularly copper, comprising electrodepositing the metal from an electrolyte solution under conditions comprising high cathode and anode current densities and high velocity flow of electrolyte past the electrode surfaces. Current densities of about 60 to 400 amp/sq ft are employed, with electrolyte flow rates of at least 75 ft/min, preferably about 150 to 400 ft/min.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.