Etching glass with HF and fluorine-containing surfactant
US4055458A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 1976 |
| Grant date | Oct 25, 1977 |
| Priority date | — |
| Expiry date | Jul 30, 1996 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C15/02
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In the etching of glass wherein glass is contacted with an aqueous etching bath containing hydrofluoric acid, and the glass is thereafter removed from the bath and rinsed, the improvement which comprises dissolving in the etching bath an acid-resistant wetting agent. Preferably the wetting agent contains fluorine, e.g. a perfluoralkane sulfonic acid quaternary ammonium salt, a perfluoralkane carboxylic acid salt, an alkoxylation product of a perfluoralkane sulfonamide, or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.