Photosensitive composition
US4063953A · kind A · utility
4Cited by
4References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1975 |
| Grant date | Dec 20, 1977 |
| Priority date | — |
| Expiry date | Dec 3, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.