Film-forming light-sensitive polymeric material carrying azidosulfonyl groups

US4065524A · kind A · utility

Assignee

• Agfa-Gevaert NV · BE

Inventors

• Urbain Leopold Laridon · Wilrijk, BE
• Gerard Albert Delzenne · 's-Gravenwezel, BE
• Helmut Mader · Odenthal, DE
• Hans Jurgen Ulrich
• Bernhard Seidel · Murnau am Staffelsee, DE

Key dates

• Filing date: Mar 17, 1975
• Grant date: Dec 27, 1977
• Expiry date: Mar 17, 1995

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S522/904
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Photo-sensitive film-forming soluble polymeric materials containing one or two polymers which can be insolubilized photochemically are disclosed. These polymeric materials contain in the same or different polymers (A) components which are reactive with moieties obtained by the photochemical decomposition of azidosulphonyl groups, e.g., a hydroxyl radical, pyridine, a phenyl radical, or a lactam radical; and (B) azidosulphonyl groups. The photo-sensitive material is insolubilized by exposure to actinic light. The material is useful in the production of photographic resists, printing plates for lithography, and the like.