Metal oxide films
US4065600A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 1971 |
| Grant date | Dec 27, 1977 |
| Priority date | — |
| Expiry date | May 18, 1991 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01B1/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a method of depositing a transparent electrically conductive metal oxide coating by reactive sputtering onto the surface of a substrate, the substrate is supported, in spaced relationship with a cathode which is to be sputtered, in a vacuum chamber containing an atmosphere comprising an inert gas and a controlled oxygen concentration at a selected total pressure. The substrate is heated prior to sputtering to a selected elevated temperature, and reactive sputtering is caused by applying a selected negative potential relative to the substrate. The oxygen in the atmosphere is provided and maintained at a selected concentration, and the heating of said substrate is controlled during sputtering to maintain the substrate temperature substantially constant at the selected temperature during substrate heating caused by sputtering. The selected values of the oxygen concentration substrate temperature, vacuum chamber pressure, and cathode potential are so chosen that the deposited coating is haze-free, and its specific electrical resistivity lies at or close to the minimum of the curve which is obtained by plotting specific electrical resistivity against oxygen concentration while mainta…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.