Minimum mean-square error linear optical filter
US4067645A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1975 |
| Grant date | Jan 10, 1978 |
| Priority date | — |
| Expiry date | Dec 29, 1995 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of forming a minimum mean-square error linear filter photographically is disclosed. The optimum filter may be obtained photographically. In one form, a first photographic negative of a monolayer of cells having a high percentage of cells of the given type is made at the focal plane of a transforming lens mounted so as to collect the light scattered by the monolayer; and, developed for a gamma of unity. Thereafter, a second photographic negative is made at the same focal plane of a monolayer of cells containing a normal percentage of cells of the given type using the first negative as a filter. The second negative is developed for a gamma of two. The resulting photographic plate is a realization of the desired optimum (minimum mean-square error linear) filter. Alternatively, a sandwich of two photographic plates, one positive and obtained from a monolayer of cells having a high percentage of cells of the given type and the other negative obtained from a monolayer of cells having a normal percentage of cells of the given type, is constructed to provide a physical realization of the desired optimum filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.