Apparatus for stabilizing beam for exposure
US4068197A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jun 23, 1976 |
| Grant date | Jan 10, 1978 |
| Priority date | — |
| Expiry date | Jun 23, 1996 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/40037
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An apparatus for stabilizing a laser beam to be used for exposure in an image-reproducing apparatus wherein said beam is suitably controlled by image signals obtained from the scanning of the original beam as modulated. A laser beam, after being suitably modulated by an ultrasonic light modulator, is branched out by a half mirror into two beams, one of which is to be used for exposing a photosensitive material and the other is used as a negative feedback signal. This feedback signal is then added to an image signal so that a linearity between exposing beam and image signals are greatly improved. Further, by improving the linearity of exposing beam, the stability of the exposing beam is simultaneously improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.