Low gloss radiation cure
US4075366A · kind A · utility
11Cited by
2References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1976 |
| Grant date | Feb 21, 1978 |
| Priority date | — |
| Expiry date | Oct 21, 1996 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D5/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A low gloss radiation cure is obtained by applying an aqueous emulsion of relatively viscous radiation curable resin and curing the applied film with appropriate radiation energy before the emulsion in the applied film breaks, to produce a cured film containing microscopic discontinuities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.