Heat developable light-sensitive material
US4076534A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 1976 |
| Grant date | Feb 28, 1978 |
| Priority date | — |
| Expiry date | Jul 26, 1996 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49845
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat developable light-sensitive material comprising a support having thereon at least one light-sensitive layer containing (1) an oxidation-reduction image-forming combination of (a) a silver salt oxidizing agent and (b) a reducing agent and (2) a catalytic amount of a light-sensitive silver halide or a compound capable of reacting with the silver salt (a) to form a light-sensitive silver halide, the light-sensitive layer further containing (3) at least one specific phthalazinone compound. The development of the above light-sensitive material is carried out simply by heating the material at a temperature of about 90.degree. to 180.degree. C. for 1 to 60 seconds after imagewise exposure. An image of black tone can be obtained without contaminating the developing machine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.