Process for stripping resist layers from substrates
US4078102A · kind A · utility
27Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 29, 1976 |
| Grant date | Mar 7, 1978 |
| Priority date | — |
| Expiry date | Oct 29, 1996 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/425
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.