Photographic method
US4081276A · kind A · utility
62Cited by
5References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 18, 1976 |
| Grant date | Mar 28, 1978 |
| Priority date | — |
| Expiry date | Oct 18, 1996 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0073
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is described for forming an image or design on the surface of a substrate by treating the substrate with a photoinitiator, such as triphenylsulfonium hexafluoroantimonate. A mask can be placed on the treated substrate which is exposed to radiant energy, resulting in the formation of a cationic polymerization catalyst on the exposed substrate surface. The substrate can then be contacted with a cationically polymerizable organic material, such as an epoxy resin, resulting in the formation of an adherent organic film on the surface of the substrate which has been exposed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.