Photosensitive composition
US4083725A · kind A · utility
2Cited by
9References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 1976 |
| Grant date | Apr 11, 1978 |
| Priority date | — |
| Expiry date | Apr 19, 1996 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/128
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition is prepared from a mixture of a cinnamic acid photosensitive resin and a halogen-substituted benzanthrone sensitizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.