Plasma cleaning device
US4088926A · kind A · utility
71Cited by
2References
7Claims
0Family size
Inventors
Key dates
| Filing date | May 10, 1976 |
| Grant date | May 9, 1978 |
| Priority date | — |
| Expiry date | May 10, 1996 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/4539
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Apparatus for cleaning contaminated surfaces such as hydro-carbon contaminant films in high vacuum environments including a plasma discharge housing for allowing a plasma to be generated in an environment having a higher pressure than the surface which is to be cleaned. A ground electrode and a radio frequency electrode partially surround a quartz plasma tube, for the introduction of an ionizable gas therein. These electrodes ionize the gas and help generate the plasma. This plasma flows through a non-constrictive aperture, through the plasma discharge housing and then on to the contaminated surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.