Process for the treatment of metal surfaces by electro-deposition of metal coatings at high current densities

US4092226A · kind A · utility

Inventors

• Nikolaus Laing · Spaichingen, DE
• Peter Schaper · Waiblingen, DE
• Werner Heierli · Zürich, CH

Key dates

• Filing date: Dec 8, 1975
• Grant date: May 30, 1978
• Expiry date: Dec 8, 1995

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S204/09
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method of electroplating a crack-free hard chromium deposit comprises having present in the electroplating bath a complex halogen-containing compound which disassociates in an aqueous solution while maintaining the bond of a halogen in the complex. A plating voltage is used which periodically superimposes high voltage pulses on the base voltage.