Method of fabricating diffraction grating masters and apparatus therefor
US4092234A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 31, 1977 |
| Grant date | May 30, 1978 |
| Priority date | — |
| Expiry date | Jan 31, 1997 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49885
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of producing a diffraction grating master which comprises exposing a plurality of reduced first grating patterns on a light sensitive layer in conformance with a predetermined code; processing the light sensitive layer to produce first gratings therein; exposing a plurality of reduced second grating patterns on the light sensitive layer (superimposed on the first gratings) and repeating the processing step to produce the second gratings; vacuum depositing a layer of silver on the superimposed first and second gratings; electroplating a layer of nickel on the silver layer on the superimposed gratings; separating the resulting nickel-silver layer from the light sensitive layer; and reinforcing the nickel-silver layer (formed in the pattern of the first and second gratings) for use as an embossing master. A special electroplating fixture used in the electroplating step insures that the nickel layer being deposited lies flat without "peeling".
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.