Process for forming an optical waveguide
US4100313A · kind A · utility
12Cited by
12References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1975 |
| Grant date | Jul 11, 1978 |
| Priority date | — |
| Expiry date | Oct 28, 1995 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/13
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A technique for generating long narrow microstructures based upon the shadowing effect of thick slits placed between a source and a substrate. The method is particularly well suited for forming optical waveguides using a mask having a slit with a width larger than the width of the stripe to be deposited and being thick relative to the width of said slit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.