Method of making a negative photoresist image

US4104070A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Holger Moritz · Holzgerlingen, DE
• Gabor Paal

Key dates

• Filing date: May 3, 1976
• Grant date: Aug 1, 1978
• Expiry date: May 3, 1996

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/0274
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a method of making a negative photoresist image on a substrate, where a normally positive working photoresist material containing 1-hydroxyethyl-2-alkyl-imidazoline is applied to a substrate, image-wise exposed with actinic radiation, heated, and blanket exposed to actinic radiation. The material which was not exposed originally is then removed with a solvent to give a negative image.