Fabrication of diffractive subtractive filter embossing master
US4108660A · kind A · utility
7Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1977 |
| Grant date | Aug 22, 1978 |
| Priority date | — |
| Expiry date | Mar 25, 1997 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A recording blank, composed of at least one diffraction grating substrate, such as nickel, covered with a layer of photoresist is used to produce an embossing master by exposing the photoresist to picture information composed of respective white and non-white manifesting regions; developing the exposed photoresist to reveal the grating portions underlying solely the white manifesting regions; electroplating and/or etching the revealed portions to level and obliterate the revealed grating portions, and then removing the remainder of the photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.