Photopolymerizable epoxy resins containing pendant unsaturated ester or amidomethyl groups
US4108803A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1977 |
| Grant date | Aug 22, 1978 |
| Priority date | — |
| Expiry date | Mar 10, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G59/28
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The resins are diepoxides of the formula ##STR1## where A IS AN INTEGER OF AVERAGE VALUE FROM 1 TO 100, PA1 Each R and R.sup.1 represents a group ##STR2## OR --O--(OC).sub.c --R.sup.5 --(CO).sub.c --O--, each R.sup.2 represents --H or a group --(CH.sub.2 NH).sub.d COC(R.sup.6).dbd.CH.sub.2, at least one of the 2a groups R.sup.2 representing --(CH.sub.2 NH).sub.d COC(R.sup.6).dbd.CH.sub.2, PA1 each R.sup.3 denotes a lower alkyl group, or conjointly each pair represents a group of formula --CH.sub.2 CH.sub.2 --, --C(R.sup.7 R.sup.8)CO--, ##STR3## --CH.sub.2 CH.sub.2 CH.sub.2 --, --COCO--, --COCOCO--, or --COC(OH).sub.2 CO--, PA1 R.sup.4 represents a divalent aliphatic, cycloaliphatic, or araliphatic radical, PA1 b, c, and d are each zero or 1, PA1 R.sup.5 represents a straight or branched chain aliphatic group or, providing c is 1, it may alternatively represent a group ##STR4## R.sup.6 represents --H or a lower alkyl group, and R.sup.7 and R.sup.8 each represent --H, --CH.sub.3, or --C.sub.2 H.sub.5. The resins are water-soluble, but, on exposure to actinic radiation polymerize and become insoluble; images of the polymerized resin may therefore be developed with water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.