Apparatus for etching the edges of semiconductor plates
US4113543A · kind A · utility
4Cited by
1References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 4, 1976 |
| Grant date | Sep 12, 1978 |
| Priority date | — |
| Expiry date | Oct 4, 1996 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A mechanochemical method of etching the side wall of circular semiconductor plates, and apparatus for performing the method. The plates are given a rotary movement while their side walls only are contacted with an etching solution, the rotary movement being produced by rotation of at least one cylindrical roller dragging along a film of the etching solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.