Polished composition containing microcrystalline wax
US4113677A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 14, 1976 |
| Grant date | Sep 12, 1978 |
| Priority date | — |
| Expiry date | Jan 14, 1996 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09G1/12
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
There is disclosed a polish having a controlled rate of evaporation and capable of withstanding large differentials in temperature which is applicable to an automobile finish as a dilute solution in hot water and method of making same. The polish contains amino functional silicones, dimethyl silicone fluids, a silicone resin film former, an emulsifiable microcrystalline wax, mineral oil, an aliphatic hydrocarbon, as well as dicoco dimethyl ammonium chloride, ethomeen acetate, a metal stearate, an ethoxylated phenol wetting agent and a cyclized rubber with the balance being soft water. Thixotropic viscosity modifiers are provided as well as perfumes and dyes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.