Electron beam exposure system
US4119854A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 1977 |
| Grant date | Oct 10, 1978 |
| Priority date | — |
| Expiry date | Nov 17, 1997 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A reference mark, common to both an electron beam and a workpiece, is arranged above and away from, but in the vicinity of, the workpiece exposure area. The position of the workpiece with respect to the reference mark is ascertained by an optical measuring means such as a Michelson type laser interferometer and the position of the electron beam with respect to the reference mark is ascertained by scanning the electron beam over said reference mark. The relative positions of the electron beam and the exposed workpiece is obtained by comparing the respective positions of the electron beam and workpiece with the reference mark. By so doing, the error between specified and actual positions of the points of impingement of the electron beam on the surface of the workpiece may be corrected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.