Photopolymerizable diepoxides containing a nitrogen heterocycle
US4124760A · kind A · utility
4Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 1977 |
| Grant date | Nov 7, 1978 |
| Priority date | — |
| Expiry date | Jul 13, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G59/26
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Diepoxides which may be photopolymerized in the presence or absence of a photosensitizer contain a group having conjugated unsaturation attached to a nitrogen heterocycle, such as a hydantoin or barbituric acid residue, forming part of an advanced diepoxide. The resultant photopolymer may be crosslinked by heating in the presence of a curing agent for epoxide resins. The diepoxides are of use in the production of printing plates and printed circuits, especially multilayer printed circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.