Composite, mask-forming, photohardenable elements
US4126466A · kind A · utility
33Cited by
5References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 22, 1976 |
| Grant date | Nov 21, 1978 |
| Priority date | — |
| Expiry date | Apr 22, 1996 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/56
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composite, photohardenable element comprising in intimate surface contact (a) a resist layer, photohardenable by exposure to actinic radiation and; (b) a soluble layer comprising a macromolecular organic polymer and at least one ultraviolet absorbent dye or pigment. In the preferred elements, the layers are disposed between and adherent to a cover sheet and a support film, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.