Process for the manufacture of trichlorosilane and silicon tetrachloride

US4130632A · kind A · utility

Assignee

• Wacker-Chemitronic Gesellschaft fur Elektronik Grundstoffe mbH · DE

Inventors

• Johann Braunsperger · Panketal, DE
• Winfried Lang · Burghausen, DE
• Thorgard Zainer · Marktl, DE

Key dates

• Filing date: May 10, 1977
• Grant date: Dec 19, 1978
• Expiry date: May 10, 1997

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01B33/107
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

Trichlorosilane or silicon tetrachloride is prepared by reacting metallic uminum-containing silicon in a reaction zone with hydrogen chloride or chlorine at a temperature between about 260.degree. and about 1200.degree. C, the reaction gas is then cooled to 40.degree. to 130.degree. in a cooling zone through which the velocity of flow is maintained at between 3 and 30 meters per second, and finally filtered.