Radiation sensitive polymeric o-nitrophenyl acetals and element
US4131465A · kind A · utility
6Cited by
2References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 27, 1977 |
| Grant date | Dec 26, 1978 |
| Priority date | — |
| Expiry date | Sep 27, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G63/6854
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.