Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
US4139384A · kind A · utility
14Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 21, 1977 |
| Grant date | Feb 13, 1979 |
| Priority date | — |
| Expiry date | Apr 21, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/30
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer composed of a photosensitive diazo-oxide resin containing a hydroxystyrene unit and a hydroxystyrene unit having an o-quinoediazide group bonded through the oxygen of the hydroxystyrene. The photosensitive layer can contain an alkali-soluble resin. The photosensitive lithographic printing plate is stable mechanically, provides a large difference in solubility between the exposed areas and the unexposed areas of the layer, and has improved printability and sensitivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.