Development of light-sensitive quinone diazide compositions
US4141733A · kind A · utility
27Cited by
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13Claims
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Assignee
Inventor
Key dates
| Filing date | Oct 25, 1977 |
| Grant date | Feb 27, 1979 |
| Priority date | — |
| Expiry date | Oct 25, 1997 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Light-sensitive compositions containing a quinone diazide which are useful in positive-working photoresists and positive-working lithographic printing plates are developed with a developing composition comprising methyltriethanol ammonium hydroxide. The developing composition provides the advantage that it is free of metal ions and, accordingly, does not contaminate the surface of the image. It is additionally advantageous in that it provides extended development latitude, increased exposure latitude, improved resist contrast, improved prebake latitude, a low depletion rate and minimal loss of image layer thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.