Photolithographic developing composition with organic lithium compound
US4147545A · kind A · utility
15Cited by
12References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1972 |
| Grant date | Apr 3, 1979 |
| Priority date | — |
| Expiry date | Nov 2, 1992 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S516/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of a substantially water-soluble organo-lithium salt, e.g., lithium naphthenate, lithium benzoate, lithium ricinoleate, etc. The novel developers quickly remove unexposed areas of the plate and yet do not detrimentally dissolve the exposed areas of the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.