Deposition method and products
US4147820A · kind A · utility
8Cited by
1References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 7, 1977 |
| Grant date | Apr 3, 1979 |
| Priority date | — |
| Expiry date | Nov 7, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/32
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing a hard deposit on a substrate is described wherein a volatile halide of tungsten or molybdenum is reacted with carbon monoxide and water vapor to effect the deposition on a substrate of a compound of the metal in a liquid phase. The liquid phase deposited on the substrate is then reacted to remove oxygen and halogen and produce a hard deposit containing the metal and carbon. Also described are products which may be producted by the above method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.