Method for electrolytic deposition of manganese
US4149944A · kind A · utility
2Cited by
6References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 4, 1977 |
| Grant date | Apr 17, 1979 |
| Priority date | — |
| Expiry date | Apr 4, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25C1/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Method of electrodepositing manganese metal from a manganese metal electrolyte which contains small quantities of sulfur dioxide, selenium and a polyacrylamide compound. The electrodeposited manganese is smoother and exhibits less "treeing", i.e. dendritic growths and high current efficiencies are achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.