Acid-resistant copolymer and photographic element incorporating same
US4152159A · kind A · utility
3Cited by
7References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1978 |
| Grant date | May 1, 1979 |
| Priority date | — |
| Expiry date | Apr 3, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.