Thermally developable light-sensitive material with a benzoic acid
US4152160A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1978 |
| Grant date | May 1, 1979 |
| Priority date | — |
| Expiry date | Apr 5, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49854
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thermally developable light-sensitive material with improved storage stability and a minimized thermal fog without an increase in both light discoloration and dark discoloration which comprises a support and having therein or in at least one layer thereon at least (a) an organic carboxylic acid silver salt comprising about 50 mol% or more of silver behenate, (b) a photocatalyst and (c) a reducing agent, and with the material containing (d) at least one compound (1) represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom or a substituent selected from the group consisting of a nitro group, a cyano group and a halogen atom, with the proviso that R.sub.1, R.sub.2 and R.sub.3 are not all simultaneously a hydrogen atom, and (2) having a half-neutralization point of from about 40 mV to about 140 mV above the half-neutralization point of benzoic acid in isopropanol.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.