Multiple electron beam vacuum vapor deposition apparatus
US4153005A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 1977 |
| Grant date | May 8, 1979 |
| Priority date | — |
| Expiry date | Jul 6, 1997 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vacuum vapor deposition apparatus having a plurality of electron beam sources spaced about the periphery of the molten alloy pool is provided. The electron beam sources have associated therewith focusing and deflection devices for directing each electron beam onto the pool surface opposite its source in the form of an inwardly curved impingement band. These create an approximate toroidal shaped heating pattern to the pool, this pattern providing uniform temperature and minimizing severe thermal gradients therein. As a result, variations in the chemistry of the vapor emanating from the pool are substantially reduced, thereby providing improved control of the as-deposited coating composition. The apparatus is especially useful in vaporizing alloys of complex chemistry, such as coating alloys in the MCrAlY family.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.